Talukder, Santanu and Kumar, Praveen and Pratap, Rudra (2014) Film thickness mediated transition in the kinetics of electric current induced flow of thin liquid metal films. In: APPLIED PHYSICS LETTERS, 104 (21).
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Abstract
Application of high electric-field between two points in a thin metallic film results in liquefaction and subsequent flow of the liquid-film from one electrode to another in a radially symmetric fashion. Here, we report the transition of the flow kinetics driven by the liquid film thickness varying from 3 to 100 nm. The mechanism of the flow behavior is observed to be independent of the film thickness; however, the kinetics of the flow depends on the film thickness and the applied voltage. An analytical model, incorporating viscosity and varying electrical resistivity with film thickness, is developed to explain the experimental observations. (C) 2014 AIP Publishing LLC.
Item Type: | Journal Article |
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Publication: | APPLIED PHYSICS LETTERS |
Publisher: | AMER INST PHYSICS |
Additional Information: | Copyright for this article belongs to the AMER INST PHYSICS, CIRCULATION & FULFILLMENT DIV, 2 HUNTINGTON QUADRANGLE, STE 1 N O 1, MELVILLE, NY 11747-4501 USA |
Department/Centre: | Division of Mechanical Sciences > Materials Engineering (formerly Metallurgy) Division of Interdisciplinary Sciences > Centre for Nano Science and Engineering |
Date Deposited: | 25 Jul 2014 10:21 |
Last Modified: | 25 Jul 2014 10:21 |
URI: | http://eprints.iisc.ac.in/id/eprint/49435 |
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