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Electric current-induced mass flow in very thin infinite metallic films

Talukder, Santanu and Kumar, Praveen and Pratap, Rudra (2013) Electric current-induced mass flow in very thin infinite metallic films. In: IEEE Transactions on Electron Devices, 60 (9). pp. 2877-2883.

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Official URL: http://dx.doi.org/10.1109/TED.2013.2273949


This paper reports on the mass transport behavior of infinitely extended, continuous, and very thin metallic films under the influence of electric current. Application of direct current of high densities (> 10(8) A/m(2)) results in visible melting of thin film at only one of the electrodes, and the melt then flows towards the other electrode in a circularly symmetric fashion forming a microscale ring pattern. For the two tested thin film systems, namely Cr and Al, of thicknesses ranging from 4 to 20 nm, the above directional flow consistently occurred from cathode to anode and anode to cathode, respectively. Furthermore, application of alternating electric current results in flow of the liquid material from both the electrodes. The dependence of critical flow behavior parameters, such as flow direction, flow velocity, and evolution of the ring diameter, are experimentally determined. Analytical models based on the principles of electromigration in liquid-phase materials are developed to explain the experimental observations.

Item Type: Journal Article
Publication: IEEE Transactions on Electron Devices
Publisher: IEEE-Institute of Electrical and Electronics Engineers
Additional Information: Copyright of this article belongs to IEEE-Institute of Electrical and Electronics Engineers.
Keywords: Electromigration; Liquid Electromigration; Reliability; Very Thin Films
Department/Centre: Division of Mechanical Sciences > Mechanical Engineering
Division of Mechanical Sciences > Materials Engineering (formerly Metallurgy)
Division of Interdisciplinary Sciences > Centre for Nano Science and Engineering
Date Deposited: 25 Oct 2013 05:30
Last Modified: 25 Oct 2013 05:30
URI: http://eprints.iisc.ac.in/id/eprint/47483

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