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Performance Analysis of Strained Monolayer MoS2 MOSFET

Sengupta, Amretashis and Ghosh, Ram Krishna and Mahapatra, Santanu (2013) Performance Analysis of Strained Monolayer MoS2 MOSFET. In: IEEE Transactions on Electron Devices, 60 (9). pp. 2782-2787.

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Official URL: http://dx.doi.org/10.1109/TED.2013.2273456


We present a computational study on the impact of tensile/compressive uniaxial (epsilon(xx)) and biaxial (epsilon(xx) = epsilon(yy)) strain on monolayer MoS2, n-, and p-MOSFETs. The material properties like band structure, carrier effective mass, and the multiband Hamiltonian of the channel are evaluated using the density functional theory. Using these parameters, self-consistent Poisson-Schrodinger solution under the nonequilibrium Green's function formalism is carried out to simulate the MOS device characteristics. 1.75% uniaxial tensile strain is found to provide a minor (6%) ON current improvement for the n-MOSFET, whereas same amount of biaxial tensile strain is found to considerably improve the p-MOSFET ON currents by 2-3 times. Compressive strain, however, degrades both n-MOS and p-MOS devices performance. It is also observed that the improvement in p-MOSFET can be attained only when the channel material becomes indirect gap in nature. We further study the performance degradation in the quasi-ballistic long-channel regime using a projected current method.

Item Type: Journal Article
Publication: IEEE Transactions on Electron Devices
Publisher: IEEE-Institute of Electrical and Electronics Engineers
Additional Information: Copyright of this article belongs to IEEE-Institute of Electrical and Electronics Engineers.
Keywords: Density Functional Theory (DFT); MoS2; MOSFET; Nonequilibrium Green's Function (NEGF); Strain
Department/Centre: Division of Electrical Sciences > Electronic Systems Engineering (Formerly Centre for Electronic Design & Technology)
Date Deposited: 10 Oct 2013 05:24
Last Modified: 10 Oct 2013 05:24
URI: http://eprints.iisc.ac.in/id/eprint/47482

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