Effect of substrate surface on electromigration-induced sliding at hetero-interfaces

Kumar, Praveen and Dutta, Indranath (2013) Effect of substrate surface on electromigration-induced sliding at hetero-interfaces. In: JOURNAL OF PHYSICS D-APPLIED PHYSICS, 46 (15).

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Abstract

Electromigration (EM)-induced interfacial sliding between a metal film and Si substrate occurs when (i) only few grains exist across the width of the film and (ii) diffusivity through the interfacial region is significantly greater than diffusivity through the film. Here, the effect of the substrate surface layer on the kinetics of EM-induced interfacial sliding is assessed using Si substrates coated with various thin film interlayers. The kinetics of interfacial sliding, and therefore the EM-driven mass flow rate, strongly depends on the type of the interlayer (and hence the substrate surface composition), such that strongly bonded interfaces with slower interfacial diffusivity produce slower sliding.

Item Type:	Journal Article
Publication:	JOURNAL OF PHYSICS D-APPLIED PHYSICS
Publisher:	IOP PUBLISHING LTD
Additional Information:	Copyright for this article belongs to the IOP PUBLISHING LTD, ENGLAND.
Department/Centre:	Division of Mechanical Sciences > Materials Engineering (formerly Metallurgy)
Date Deposited:	20 May 2013 06:38
Last Modified:	20 May 2013 06:38
URI:	http://eprints.iisc.ac.in/id/eprint/46480

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