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Structural and mechanical properties of room temperature sputter deposited CrN coatings

Raman, Thulasi KH and Kiran, MSRN and Ramamurty, U and Rao, Mohan G (2012) Structural and mechanical properties of room temperature sputter deposited CrN coatings. In: MATERIALS RESEARCH BULLETIN, 47 (12). pp. 4463-4466.

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Official URL: http://dx.doi.org/10.1016/j.materresbull.2012.09.0...


Chromium nitride (CrN) thin films were deposited at room temperature on silicon and glass substrates using DC reactive magnetron sputtering in Ar + N-2 plasma. Structure and mechanical properties of these films were examined by using XRD, FESEM and nanoindentation techniques. XRD studies revealed that films are of mixed phase at lower nitrogen partial pressure (P-N2) and single phase at higher (P-N2). Microscopy results show that the films were composed of non-equiaxed columns with nanocrystallite morphology. The hardness and elastic modulus of the films increase with increasing nitrogen partial pressure (P-N2). A maximum hardness of similar to 29 GPa and elastic modulus of 341 GPa were obtained, which make these films useful for several potential applications. (C) 2012 Elsevier Ltd. All rights reserved.

Item Type: Journal Article
Additional Information: Copyright for this article belongs to PERGAMON-ELSEVIER SCIENCE LTD, ENGLAND
Keywords: Nitrides;Sputtering;X-ray diffraction;Electron microscopy;Mechanical properties
Department/Centre: Division of Mechanical Sciences > Materials Engineering (formerly Metallurgy)
Division of Physical & Mathematical Sciences > Instrumentation Appiled Physics
Date Deposited: 22 Feb 2013 12:14
Last Modified: 22 Feb 2013 12:14
URI: http://eprints.iisc.ac.in/id/eprint/45868

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