Silicon surface texturing with a combination of potassium hydroxide and tetra-methyl ammonium hydroxide etching

Sridharan, Sindhuja and Bhat, Navakanta and Bhat, KN (2013) Silicon surface texturing with a combination of potassium hydroxide and tetra-methyl ammonium hydroxide etching. In: APPLIED PHYSICS LETTERS, 102 (2).

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Abstract

A two step silicon surface texturing, consisting of potassium hydroxide (KOH) etching followed by tetra-methyl ammonium hydroxide etching is presented. This combined texturing results in 13.8% reflectivity at 600 nm compared to 16.1% reflectivity for KOH etching due to the modification of microstructure of etched pyramids. This combined etching also results in significantly lower flat-band voltage (V-FB) (-0.19V compared to -1.3 V) and interface trap density (D-it) (2.13 x 10(12) cm(-2) eV(-1) compared to 3.2 x 10(12) cm(-2) eV(-1)). (C) 2013 American Institute of Physics. http://dx.doi.org/10.1063/1.4776733]

Item Type:	Journal Article
Publication:	APPLIED PHYSICS LETTERS
Publisher:	AMER INST PHYSICS
Additional Information:	Copyright for this article belongs to AMER INST PHYSICS, MELVILLE, USA
Department/Centre:	Division of Electrical Sciences > Electrical Communication Engineering
Date Deposited:	28 Feb 2013 08:31
Last Modified:	28 Feb 2013 08:31
URI:	http://eprints.iisc.ac.in/id/eprint/45852

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