Low dimensional fabrication of giant dielectric CaCu3Ti4O12 through soft e-beam lithography

Banerjee, Nirupam and Krupanidhi, SB (2013) Low dimensional fabrication of giant dielectric CaCu3Ti4O12 through soft e-beam lithography. In: JOURNAL OF ALLOYS AND COMPOUNDS, 547 . pp. 147-151.

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Abstract

We report low-dimensional fabrication of technologically important giant dielectric material CaCu3Ti4O12 (CCTO) using soft electron beam lithographic technique. Sol-gel precursor solution of CCTO was prepared using inorganic metal nitrates and Ti-isopropoxide. Employing the prepared precursor solution and e-beam lithographically fabricated resist mask CCTO dots with similar to 200 nm characteristic dimension were fabricated on platinized Si (111) substrate. Phase formation, chemical purity and crystalline nature of fabricated low dimensional structures were investigated with X-ray diffraction (XRD), energy dispersive X-ray spectroscopy (EDS) and selected area electron diffraction (SAED), respectively. Morphological investigations were carried out with the help of scanning electron microscopy (SEM) and transmission electron microscopy (TEM). This kind of solution based fabrication of patterned low-dimensional high dielectric architectures might get potential significance for cost-effective technological applications. (C) 2012 Elsevier B.V. All rights reserved.

Item Type:	Journal Article
Publication:	JOURNAL OF ALLOYS AND COMPOUNDS
Publisher:	ELSEVIER SCIENCE SA
Additional Information:	Copyright for this article belongs to ELSEVIER SCIENCE SA, SWITZERLAND
Keywords:	High dielectric material;Soft lithography;Nano-fabrication
Department/Centre:	Division of Chemical Sciences > Materials Research Centre
Date Deposited:	23 Jan 2013 09:14
Last Modified:	23 Jan 2013 09:14
URI:	http://eprints.iisc.ac.in/id/eprint/45630

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