Laurila, T and Karppinen, J and Vuorinen, V and Li, J and Paul, A and Paulasto-Krockel, M (2012) Effect of isothermal aging and electromigration on the microstructural evolution of solder interconnections during thermomechanical loading. In: Journal of Electronic Materials, 41 (11). pp. 3179-3195.
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Abstract
The effect of different pre-aging treatments on the microstructural evolution of lead-free solder and growth of interfacial intermetallic compound layers under thermal cycling has been investigated in this work. The results show that there are distinct differences in the microstructural changes between samples with no pretreatment, samples that have experienced thermal annealing at 125A degrees C for 750 h before thermal cycling, and those that have had direct current (DC) stressing for 750 h as pretreatment. The microstructural evolution of the solder matrix is rationalized by utilizing the science of microstructures and analysis of the influence of electron flow on the precipitation phenomena. The finite-element method is utilized to understand the loading conditions imposed on the solder interconnections during cyclic stressing. The growth of intermetallic reaction layers is further analyzed by utilizing quantitative thermodynamic calculations coupled with kinetic analysis. The latter is based on the changes in the intrinsic diffusion fluxes of elements induced by current flow and alloying elements present in the system. With this concurrent approach the differences seen in thermal cycling behavior between the different pre-aging treatments can be explained.
Item Type: | Journal Article |
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Publication: | Journal of Electronic Materials |
Publisher: | Springer |
Additional Information: | Copyright of this article belongs to Springer. |
Keywords: | Electromigration; Solid-State Diffusion; Intermetallic Reactions; Lead-Free; Recrystallization; Reliability |
Department/Centre: | Division of Mechanical Sciences > Materials Engineering (formerly Metallurgy) |
Date Deposited: | 19 Feb 2013 05:22 |
Last Modified: | 19 Feb 2013 05:22 |
URI: | http://eprints.iisc.ac.in/id/eprint/45373 |
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