ePrints@IIScePrints@IISc Home | About | Browse | Latest Additions | Advanced Search | Contact | Help

Polymer microfabrication by scanning based microstereolithography: Optical design and material functionality

Goswami, Ankur and Phani, Arindam and Umarji, AM and Madras, Giridhar (2012) Polymer microfabrication by scanning based microstereolithography: Optical design and material functionality. In: REVIEW OF SCIENTIFIC INSTRUMENTS, 83 (9).

[img] PDF
rev_sci_ins_83_2012.pdf - Published Version
Restricted to Registered users only

Download (2MB) | Request a copy
Official URL: http://dx.doi.org/10.1063/1.4750975


Several research groups have attempted to optimize photopolymerization parameters to increase the throughput of scanning based microstereolithography (MSL) systems through modified beam scanning techniques. Efforts in reducing the curing line width have been implemented through high numerical aperture (NA) optical setups. However, the intensity contour symmetry and the depth of field of focus have led to grossly non-vertical and non-uniform curing profiles. This work tries to review the photopolymerization process in a scanning based MSL system from the aspect of material functionality and optical design. The focus has been to exploit the rich potential of photoreactor scanning system in achieving desired fabrication modalities (minimum curing width, uniform depth profile, and vertical curing profile) even with a reduced NA optical setup and a single movable stage. The present study tries to manipulate to its advantage the effect of optimized lower c] (photoinitiator (PI) concentration) in reducing the minimum curing width to similar to 10-20 mu m even with a higher spot size (similar to 21.36 mu m) through a judiciously chosen ``monomer-PI'' system. Optimization on grounds of increasing E-max (maximum laser exposure energy at surface) by optimizing the scan rate provides enough time for the monomer or resin to get cured across the entire resist thickness (surface to substrate similar to 10-100 mu m), leading to uniform depth profiles along the entire scan lengths. (C) 2012 American Institute of Physics. http://dx.doi.org/10.1063/1.4750975]

Item Type: Journal Article
Additional Information: Copyright for this article belongs to the American Institute of Physics
Department/Centre: Division of Chemical Sciences > Materials Research Centre
Division of Mechanical Sciences > Chemical Engineering
Date Deposited: 13 Feb 2013 10:36
Last Modified: 13 Feb 2013 10:36
URI: http://eprints.iisc.ac.in/id/eprint/45349

Actions (login required)

View Item View Item