Kumar, Rakesh R and Rao, Narasimha K and Phani, AR (2012) Bismuth catalyzed growth of silicon nanowires by electron beam evaporation. In: MATERIALS LETTERS, 82 . pp. 163-166.
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Abstract
Silicon nanowires (NWs) have been grown in the vapor phase for the first time with bismuth (Bi) as a catalyst using the electron beam evaporation method at a low substrate temperature of 280 degrees C. The grown Si nanowires were randomly oriented on the substrate with an average length of 900 nm for a deposition time of 15 min. Bi faceted nanoparticles (crowned) at the end of the grown Si nanowires have been observed and attributed to the Vapor-Liquid-Solid (VLS) growth mechanism. Transmission Electron Microscopy analysis on the nanowires revealed their single crystalline nature and interestingly bismuth particles were observed in Si nanowires. The obtained results have shown a new window for Si nanowires growth with bismuth as a catalyst. (C) 2012 Elsevier B.V. All rights reserved.
Item Type: | Journal Article |
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Publication: | MATERIALS LETTERS |
Publisher: | ELSEVIER SCIENCE BV |
Additional Information: | Copyright for this article belongs to Elsevier |
Keywords: | Semiconductors; Silicon nanowires; Bismuth catalyst; Electron beam evaporation; Thin films |
Department/Centre: | Division of Physical & Mathematical Sciences > Instrumentation Appiled Physics |
Date Deposited: | 17 Sep 2012 10:33 |
Last Modified: | 17 Sep 2012 10:33 |
URI: | http://eprints.iisc.ac.in/id/eprint/45063 |
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