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Photoresist functionalisation method for high-density protein microarrays using photolithography

Goudar, VS and Suran, S and Varma, MM (2012) Photoresist functionalisation method for high-density protein microarrays using photolithography. In: MICRO & NANO LETTERS, 7 (6). pp. 549-553.

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Official URL: http://dx.doi.org/10.1049/mnl.2012.0336


Since the last decade, there is a growing need for patterned biomolecules for various applications ranging from diagnostic devices to enabling fundamental biological studies with high throughput. Protein arrays facilitate the study of protein-protein, protein-drug or protein-DNA interactions as well as highly multiplexed immunosensors based on antibody-antigen recognition. Protein microarrays are typically fabricated using piezoelectric inkjet printing with resolution limit of similar to 70-100 mu m limiting the array density. A considerable amount of research has been done on patterning biomolecules using customised biocompatible photoresists. Here, a simple photolithographic process for fabricating protein microarrays on a commercially available diazo-naphthoquinone-novolac-positive tone photoresist functionalised with 3-aminopropyltriethoxysilane is presented. The authors demonstrate that proteins immobilised using this procedure retain their activity and therefore form functional microarrays with the array density limited only by the resolution of lithography, which is more than an order of magnitude compared with inkjet printing. The process described here may be useful in the integration of conventional semiconductor manufacturing processes with biomaterials relevant for the creation of next-generation bio-chips.

Item Type: Journal Article
Department/Centre: Division of Interdisciplinary Sciences > Centre for Nano Science and Engineering
Date Deposited: 31 Jul 2012 12:03
Last Modified: 31 Jul 2012 12:03
URI: http://eprints.iisc.ac.in/id/eprint/44901

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