Non-Thermal Plasma Applications at Very Low Temperature

Rajanikanth, BS and Kinoshita, K and Yanagihara, K and Mizuno, A and Shimizu, K (1998) Non-Thermal Plasma Applications at Very Low Temperature. In: Combustion Science and Technology, 133 (1-3). pp. 49-63.

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Abstract

Application of non-thermal plasma for gas cleaning is gaining prominence in the recent years. Normally, the gas treatment was carried out at or above room temperature, by the dry type plasma reactor. However, this treatment is still inadequate in the removal of certain stable gases present in the flue gas mixture. We propose the non-thermal plasma process at very low temperature, and report here some interesting results of treatment of NO or N2O with pulsed plasma below — 100°C ambient temperature. Direct methanol synthesis from CH4 and CO2 at very low temperature is also reported. A comparative analysis of the various tests are presented together with a note on the energy consideration

Item Type:	Journal Article
Publication:	Combustion Science and Technology
Publisher:	Taylor and Francis Group
Additional Information:	Copyright of this article belongs to Taylor and Francis Group.
Keywords:	Non-thermal plasma;pulsed discharge;gas cleaning;nitric oxide;nitrous oxide;methanol synthesis
Department/Centre:	Division of Electrical Sciences > Electrical Engineering
Date Deposited:	12 Apr 2012 07:46
Last Modified:	12 Apr 2012 07:46
URI:	http://eprints.iisc.ac.in/id/eprint/44119

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