Microstructure evolution and metastable phase formation in laser-ablation-deposited films of Ti5Si3 intermetallic compound

Chattopadhyay, Kamanio and Das, Puspendu kumar and Bysakh, Sandip (2002) Microstructure evolution and metastable phase formation in laser-ablation-deposited films of Ti5Si3 intermetallic compound. In: Philosophical Magazine A, 82 (6). pp. 1235-1248.

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Abstract

Thin films of Ti62.5Si37.5 composition were deposited by the pulsed-laser ablation technique on single-crystal Nad substrates at room temperature and on ′single-crystal′ superalloy substrates at elevated temperatures. Both vapour and liquid droplets generated by pulsed-laser ablation of the target become quenched on the substrate. Amorphization had taken place in the process of quenching of vapour-plasma as well as small liquid droplets on NaCl substrates at room temperature. In addition to the formation of Ti5Si3, a metastable fcc phase (a 0 = 0.433 nm) also forms in micron-sized large droplets as well as in the medium-sized submicron droplets. The same metastable fcc phase nucleates during deposition from the vapour state at 500°C and at 600°C on a superalloy substrate as well as during crystallization of the amorphous phase. The evolution of the metastable fcc phase in the Ti-Si system during non-equilibrium processing is reported for the first time.

Item Type:	Journal Article
Publication:	Philosophical Magazine A
Publisher:	Taylor and Francis Group
Additional Information:	Copyright of this article belongs to Taylor and Francis Group.
Department/Centre:	Division of Mechanical Sciences > Materials Engineering (formerly Metallurgy)
Date Deposited:	23 Feb 2012 06:22
Last Modified:	13 Mar 2019 06:21
URI:	http://eprints.iisc.ac.in/id/eprint/43187

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