Rao, Rama N and Chandramani, R and Rao, Mohan G (1999) Tantalum oxide films prepared by unbalanced reactive magnetron sputtering. In: Journal of Materials Science Letters, 18 (23). pp. 1949-1951.
PDF
Tantalum_oxide_films_prepared.pdf - Published Version Restricted to Registered users only Download (38kB) | Request a copy |
Official URL: http://www.springerlink.com/content/nq33w5j0781413...
Item Type: | Journal Article |
---|---|
Publication: | Journal of Materials Science Letters |
Publisher: | Springer |
Additional Information: | Copyright of this article belongs to Springer. |
Department/Centre: | Division of Physical & Mathematical Sciences > Instrumentation Appiled Physics |
Date Deposited: | 02 Jul 2011 06:08 |
Last Modified: | 02 Jul 2011 06:08 |
URI: | http://eprints.iisc.ac.in/id/eprint/38839 |
Actions (login required)
View Item |