Majumdar, Amlan and Balasubramanian, Sathya and Venkataraman, V and Balasubramanian, N (1997) Reactivation kinetics of boron acceptors in hydrogenated silicon during zero bias anneal. In: Journal of Applied Physics, 82 (1). 192-195 .
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Abstract
The reactivation kinetics of passivated boron accepters in hydrogenated silicon during zero bias annealing in the temperature range of 65-130 degrees C are reported, For large annealing times and high annealing temperatures, the reactivation process follows second-order kinetics and is rate limited by a thermally activated <(H)over tilde (2)> complex formation process, For short annealing times and low annealing temperatures, the reactivation rate is found to be larger than that due to <(H)over tilde (2)> complex formation alone. We conclude that the faster reactivation is caused by the diffusion of the liberated hydrogen atoms into the bulk as well as <(H)over tilde (2)> complex formation. The effective diffusion coefficient of hydrogen is measured and found to obey the Arrhenius relation with an activation energy (1.41 +/- 0.1) eV. (C) 1997 American Institute of Physics.
Item Type: | Journal Article |
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Publication: | Journal of Applied Physics |
Publisher: | American Institute of Physics |
Additional Information: | Copyright of this article belongs to American Institute of Physics. |
Department/Centre: | Division of Physical & Mathematical Sciences > Physics |
Date Deposited: | 30 Jun 2011 13:43 |
Last Modified: | 30 Jun 2011 13:43 |
URI: | http://eprints.iisc.ac.in/id/eprint/38379 |
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