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Structural and optical properties of RF sputtered Bi2VO5.5 thin films

Viswanathan, M and Thutupalli, GKM and Varma, KBR (1996) Structural and optical properties of RF sputtered Bi2VO5.5 thin films. In: Solid State Communications, 98 (6). 535-538 .

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Official URL: http://dx.doi.org/10.1016/0038-1098(96)00097-X


Thin films of Bismuth Vanadate Bi2VO5.5 (BiV) have been deposited on amorphous quartz and polycrystalline silicon substrates by r.f. sputtering technique and characterised for their structural and optical properties. The os-deposited films at room temperature are found to be amorphous and transparent over the spectral range of 0.55 mu m to 12 mu m. Post-deposition annealing at 400 degrees C in air shows the formation of the BiV crystalline phase. The optical constants namely refractive index. extinction coefficient and optical bandgap of both amorphous and crystalline films have been determined. The refractive index of the as-deposited film is around 2.4 at 0.7 mu m and drops to 2.26 at 1.56 mu m. The optical bandgap of the material has been determined from the computed values of the absorption coefficients.

Item Type: Journal Article
Publication: Solid State Communications
Publisher: Elsevier Science
Additional Information: Copyright of this article belongs to Elsevier Science.
Keywords: A.thin films;C.scanning and transmission electron microscopy;D.optical properties
Department/Centre: Division of Chemical Sciences > Materials Research Centre
Date Deposited: 13 May 2011 06:45
Last Modified: 13 May 2011 06:45
URI: http://eprints.iisc.ac.in/id/eprint/37560

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