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Passivation of surface and bulk defects in p-GaSb by hydrogenated amorphous silicon treatment

Dutta, PS and Sreedhar, AK and Bhat, HL and Dubey, GC and Kumar, V and Dieguez, E and Pal, U and Piqueras, J (1996) Passivation of surface and bulk defects in p-GaSb by hydrogenated amorphous silicon treatment. In: Journal of Applied Physics, 79 (6). pp. 3246-3252.

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Passivation of point and extended defects in GaSb has been observed as a result of hydrogenated amorphous silicon (a-Si:H) treatment by the glow discharge technique. Cathodoluminescence (CL) images recorded at various depths in the samples clearly show passivation of defects on the surface as well as in the bulk region. The passivation of various recombination centers in the bulk is attributed to the formation of hydrogen-impurity complexes by diffusion of hydrogen ions from the plasma a-Si:H acts as a protective cap layer and prevents surface degradation which is usually encountered by bare exposure to hydrogen plasma. An enhancement in luminescence intensity up to 20 times is seen due to the passivation of nonradiative recombination centers. The passivation efficiency is found to improve with an increase in a-Si:H deposition temperature. The relative passivation efficiency of donors and acceptors by hydrogen in undoped and Te-compensated p-GaSb has been evaluated by CL and by the temperature dependence of photoluminescence intensities. Most notably, effective passivation of minority dopants in tellurium compensated p-GaSb is evidenced for the first time. (C) 1996 American Institute of Physics.

Item Type: Journal Article
Publication: Journal of Applied Physics
Publisher: American Institute of Physics
Additional Information: Copyright of this article belongs to American Institute of Physics.
Department/Centre: Division of Physical & Mathematical Sciences > Physics
Date Deposited: 10 May 2011 05:18
Last Modified: 10 May 2011 05:18
URI: http://eprints.iisc.ac.in/id/eprint/37456

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