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Kinetics of self-assembled InN quantum dots grown on Si (111) by plasma-assisted MBE

Kumar, Mahesh and Roul, Basanta and Bhat, Thirumaleshwara N and Rajpalke, Mohana K and Sinha, Neeraj and Kalghatgi, AT and Krupanidhi, SB (2011) Kinetics of self-assembled InN quantum dots grown on Si (111) by plasma-assisted MBE. In: Journal of Nanoparticle Research, 13 (3). pp. 1281-1287.

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One of the scientific challenges of growing InN quantum dots (QDs), using Molecular beam epitaxy (MBE), is to understand the fundamental processes that control the morphology and distribution of QDs. A systematic manipulation of the morphology, optical emission, and structural properties of InN/Si (111) QDs is demonstrated by changing the growth kinetics parameters such as flux rate and growth time. Due to the large lattice mismatch, between InN and Si (similar to 8%), the dots formed from the Strannski-Krastanow (S-K) growth mode are dislocated. Despite the variations in strain (residual) and the shape, both the dot size and pair separation distribution show the scaling behavior. We observed that the distribution of dot sizes, for samples grown under varying conditions, follow the scaling function.

Item Type: Journal Article
Publication: Journal of Nanoparticle Research
Publisher: Springer
Additional Information: Copyright of this article belongs to Springer.
Keywords: Indium nitride;Kinetics;Photoluminescence;Scaling behavior; Semiconductor quantum dot
Department/Centre: Division of Chemical Sciences > Materials Research Centre
Date Deposited: 19 Apr 2011 06:48
Last Modified: 19 Apr 2011 06:48
URI: http://eprints.iisc.ac.in/id/eprint/36952

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