Sharma, Sudhir Kumar and Vijaya, HS and Mohan, S (2010) Influence of Substrate Temperature and Deposition Rate on Structural and Mechanical Properties of Shape Memory NiTi Films. In: Conference On Carbon Nanotubes, Graphene, and Associated , AUG 01-04, 2010, San Diego, CA, , pp. 44-51.
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NiTi thin films deposited by DC magnetron sputtering of an alloy (Ni/Ti:45/55) target at different deposition rates and substrate temperatures were analyzed for their structure and mechanical properties. The crystalline structure, phase-transformation and mechanical response were characterized by X-ray diffraction (XRD), Differential Scanning Calorimetry (DSC) and Nano-indentation techniques, respectively. The films were deposited on silicon substrates maintained at temperatures in the range 300 to 500 degrees C and post-annealed at 600 degrees C for four hours to ensure film crystallinity. Films deposited at 300 degrees C and annealed for 600 degrees C have exhibited crystalline behavior with Austenite phase as the prominent phase. Deposition onto substrates held at higher deposition temperatures (400 and 500 degrees C) resulted in the co-existence of Austenite phase along with Martensite phase. The increase in deposition rates corresponding to increase in cathode current from 250 to 350 mA has also resulted in the appearance of Martensite phase as well as improvement in crystallinity. XRD analysis revealed that the crystalline film structure is strongly influenced by process parameters such as substrate temperature and deposition rate. DSC results indicate that the film deposited at 300 degrees C had its crystallization temperature at 445 degrees C in the first thermal cycle, which is further confirmed by stress temperature response. In the second thermal cycle the Austenite and Martensite transitions were observed at 75 and 60 degrees C respectively. However, the films deposited at 500 degrees C had the Austenite and Martensite transitions at 73 and 58 degrees C, respectively. Elastic modulus and hardness values increased from 93 to 145 GPa and 7.2 to 12.6 GPa, respectively, with increase in deposition rates. These results are explained on the basis of change in film composition and crystallization. (C) 2010 Published by Elsevier Ltd
| Item Type: | Conference Paper |
|---|---|
| Series.: | Physics Procedia |
| Publisher: | The International Society for Optical Engineering. |
| Additional Information: | Copyright of this article belongs to The International Society for Optical Engineering. |
| Keywords: | NiTi shape memory alloy; DC magnetron sputtering; X-Ray diffraction; nano-indentation; differential scanning calorimetry |
| Department/Centre: | Division of Physical & Mathematical Sciences > Physics |
| Date Deposited: | 07 Mar 2011 08:44 |
| Last Modified: | 07 Mar 2011 08:44 |
| URI: | http://eprints.iisc.ac.in/id/eprint/35918 |
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