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Effect of substrate roughness on growth of diamond by hot filament CVD

Mallik, Awadesh K and Binu, SR and Satapathy, LN and Narayana, Chandrabhas and Seikh, Md Motin and Shivashankar, SA and Biswas, SK (2010) Effect of substrate roughness on growth of diamond by hot filament CVD. In: Bulletin of Materials Science, 33 (3). pp. 251-255.

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Polycrystalline diamond coatings are grown on Si (100) substrate by hot filament CVD technique. We investigate here the effect of substrate roughening on the substrate temperature and methane concentration required to maintain high quality, high growth rate and faceted morphology of the diamond coatings. It has been shown that as we increase the substrate roughness from 0.05 mu m to 0.91 mu m (centre line average or CLA) there is enhancement in deposited film quality (Raman peak intensity ratio of sp (3) to non-sp (3) content increases from 1.65 to 7.13) and the substrate temperature can be brought down to 640A degrees C without any additional substrate heating. The coatings grown at adverse conditions for sp (3) deposition has cauliflower morphology with nanocrystalline grains and coatings grown under favourable sp (3) condition gives clear faceted grains.

Item Type: Journal Article
Publication: Bulletin of Materials Science
Publisher: Indian Academy of Sciences
Additional Information: Copyright of this article belongs to Indian Academy of Sciences.
Keywords: Hot filament CVD; polycrystalline diamond coating; roughness; morphology; quality.
Department/Centre: Division of Chemical Sciences > Materials Research Centre
Division of Chemical Sciences > Solid State & Structural Chemistry Unit
Division of Mechanical Sciences > Mechanical Engineering
Date Deposited: 28 Oct 2010 06:16
Last Modified: 28 Oct 2010 06:16
URI: http://eprints.iisc.ac.in/id/eprint/33450

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