Structural and electrical characterization of erbium oxide films grown on Si(100) by low-pressure metalorganic chemical vapor deposition

Singh, MP and Thakur, CS and Shalini, K and Bhat, N and Shivashankar, SA (2003) Structural and electrical characterization of erbium oxide films grown on Si(100) by low-pressure metalorganic chemical vapor deposition. In: Applied Physics Letters, 83 (14). pp. 2889-2891.

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Abstract

We report the structural and electrical properties of $Er_2O_3$ films grown on Si(100) in the temperature range 450-600 °C by low-pressure metalorganic chemical vapor deposition using Er(acac)3.phen, the phenanthroline adduct of erbium acetylacetonate, as the precursor. The film properties are correlated with the growth and processing conditions. The structural characterization reveals that films grown at lower temperatures are smooth, but poorly crystalline, whereas films grown at higher temperatures are polycrystalline. A dielectric constant in the range 8-20, a minimum total fixed oxide charge density $(N_f) of -1x10^1^0 cm^-2$, and a minimum hysteresis of 10 mV in the bidirectional capacitance-voltage characteristics are demonstrated.

Item Type:	Journal Article
Publication:	Applied Physics Letters
Publisher:	American Institute of Physics
Additional Information:	Copyright for this article belongs to American Institute of Physics (AIP).
Department/Centre:	Division of Physical & Mathematical Sciences > Physics
Date Deposited:	11 Apr 2005
Last Modified:	19 Sep 2010 04:18
URI:	http://eprints.iisc.ac.in/id/eprint/2761

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