Rao, Narasimha K and Mohan, S and Hegde, MS and Balasubramanian, TV (1993) Chemical composition of electron-beam evaporated TiO2 films. In: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 11 (2). pp. 394-397.
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Abstract
Chemical composition and optical properties of TiO2 films depend on deposition conditions. A detailed investigation has been made on the influence of deposition parameters, such as starting material, substrate temperature, and post deposition heating in air on the chemical composition of TiO2 films deposited by electron-beam evaporation of TiO and TiO2 in neutral and ionized oxygen. The chemical composition of the films has been analyzed by x-ray photoelectron spectroscopy and Auger electron spectroscopy. The composition of TiO2 films deposited in neutral oxygen were found to contain lower oxides of titanium in addition to TiO2 whereas films prepared in ionized oxygen were found to be stoichiometric TiO2.
Item Type: | Journal Article |
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Publication: | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films |
Publisher: | American Vacuum Society |
Additional Information: | Copyright for this article belongs to American Vacuum Society. |
Department/Centre: | Division of Physical & Mathematical Sciences > Instrumentation Appiled Physics Division of Chemical Sciences > Solid State & Structural Chemistry Unit |
Date Deposited: | 05 Apr 2005 |
Last Modified: | 19 Sep 2010 04:18 |
URI: | http://eprints.iisc.ac.in/id/eprint/2745 |
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