An Algorithm for Optimization of Experimental Parameters for Maximum Uniformity of Film Thickness

Ramprasad, BS and Radha, TS and Rao, Ramakrishna M (1972) An Algorithm for Optimization of Experimental Parameters for Maximum Uniformity of Film Thickness. In: Journal of Vacuum Science and Technology, 9 (3). pp. 1104-1105.

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Abstract

A simple method for evaluating the geometrical parameters yielding maximum uniformity of film thickness on rotating substrates is described. The algorithm is based on numerical integration of the function for relative thickness. It is shown that maximum uniformity is obtained for a normalized source-to-substrate distance ratio of h/ \delta = 1.37.

Item Type:	Journal Article
Publication:	Journal of Vacuum Science and Technology
Publisher:	American Vacuum Society
Additional Information:	Copyright for this article belongs to American Vacuum Society.
Department/Centre:	Division of Physical & Mathematical Sciences > Instrumentation Appiled Physics
Date Deposited:	05 Apr 2005
Last Modified:	19 Sep 2010 04:18
URI:	http://eprints.iisc.ac.in/id/eprint/2739

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