Microstructural evolution of tungsten oxide thin films

Hembram, KPSS and Thomas, Rajesh and Rao, Mohan G (2009) Microstructural evolution of tungsten oxide thin films. In: 2nd International Conference on Physics at Surfaces and Interfaces (PSI2009), FEB 23-27, 2009, Puri, India, pp. 419-422.

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Abstract

Tungsten oxide thin films are of great interest due to their promising applications in various optoelectronic thin film devices. We have investigated the microstructural evolution of tungsten oxide thin films grown by DC magnetron sputtering on silicon substrate. The structural characterization and surface morphology were carried out using X-ray diffraction and Scanning Electron Microscopy (SEM). The as deposited films were amorphous, where as, thin films annealed above 400 degrees C were crystalline. In order to explain the microstructural changes due to annealing, we have proposed a ``instability wheel'' model for the evolution of the microstructure. This model explains the transformation of mater into various geometries within them selves, followed by external perturbation.

Item Type:	Conference Paper
Publication:	APPLIED SURFACE SCIENCE
Publisher:	Elsevier Science
Additional Information:	Copyright for this article belongs to Elsevier Science.
Keywords:	Tungsten oxide; Annealing; Microstructure; Instability
Department/Centre:	Division of Physical & Mathematical Sciences > Instrumentation Appiled Physics
Date Deposited:	04 Dec 2009 05:39
Last Modified:	19 Sep 2010 05:53
URI:	http://eprints.iisc.ac.in/id/eprint/25069

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