Ramprasad, BS and Radha, TS (1974) Optimum geometry for uniform deposits on a rotating substrate from a point source. In: Vacuum, 24 (4). pp. 165-166.
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Abstract
The application of an algorithm shows that maximum uniformity of film thickness on a rotating substrate is achieved for a normalized source-to-substrate distance ratio, h/r =1.183.
| Item Type: | Journal Article |
|---|---|
| Publication: | Vacuum |
| Publisher: | Elsevier Science |
| Additional Information: | Copyright of this article belongs to Elsevier Science. |
| Department/Centre: | Division of Physical & Mathematical Sciences > Instrumentation Appiled Physics |
| Date Deposited: | 19 Dec 2009 07:34 |
| Last Modified: | 19 Sep 2010 05:45 |
| URI: | http://eprints.iisc.ac.in/id/eprint/23317 |
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