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Ionisation and attachment in binary mixtures of SF6-N2 and CCl2F2-N2

Siddagangappa, MC and Lakshminarasimha, CS and Naidu, MS (1983) Ionisation and attachment in binary mixtures of SF6-N2 and CCl2F2-N2. In: Journal of Physics D: Applied Physics, 16 (5). pp. 763-772.

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Official URL: http://www.iop.org/EJ/abstract/0022-3727/16/5/009/


Experimental results are presented of ionisation (a)a nd electron attachment ( v ) coefficients evaluated from the steady-state Townsend curregnrto wth curves for SFsN2 and CC12FrN2 mixtures over the range 60 S E/P 6 240 (where E is the electric field in V cm" and P is the pressure in Torr reduced to 20'C). In both the mixtures the attachment coefficients (vmu) evaluated were found to follow the relationship; where 7 is the attachment coefficient of pure electronegative gas, F is the fraction of the electronegative gas in the mixture and /3 is a constant. The ionisation coefficients (amlx) generally obeyed the relationship where w2a nd aAa re thei onisation coefficients of nitrogen and the attachinggraess pectively. However, in case of CC12FrN2 mixtures, there were maxima in the a,,,v,a,l ues for CCI2F2 concentrations varying between 10% and 30% at all values of E/P investigated. Effective ionisation coefficients (a - p)/P obtained in these binary mixtures show that the critical E/P (corresponding to (a - q)/P = 0) increases with increase in the concentration of the electronegative gas up to 40%. Further increase in the electronegative gas content does not seem to alter the critical E/P.

Item Type: Journal Article
Publication: Journal of Physics D: Applied Physics
Publisher: Institute of Physics
Additional Information: Copyright of this article belongs to Institute of Physics.
Department/Centre: Division of Electrical Sciences > High Voltage Engineering (merged with EE)
Date Deposited: 27 Aug 2009 04:36
Last Modified: 19 Sep 2010 05:33
URI: http://eprints.iisc.ac.in/id/eprint/20615

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