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A Method for the Deposition of Transparent Conducting Thin-Films of Tin Oxide

Tarey, Ram D. and Raju, TA (1985) A Method for the Deposition of Transparent Conducting Thin-Films of Tin Oxide. In: Thin Solid Films, 128 (3-4). pp. 181-189.

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A modified method has been developed for the deposition of transparent semiconducting thin films of tin oxide, involving the chemical vapour phase oxidation of tin iodide. These films show sheet resistances greater than 100 Ω/□ and an average optical transmission in the visible range exceeding 80%. The method avoids uncontrolled contamination, resulting in better reproducibility of the films. The films showed direct and indirect transitions and the possibility of an indirect forbidden transition. X-ray diffraction studies reveal that the films are polycrystalline. The low mobility values of the films have been attributed to the grain boundary scattering effect.

Item Type: Journal Article
Publication: Thin Solid Films
Publisher: Elsevier Science
Additional Information: The copyright of this article belongs to Elsevier Science
Department/Centre: Division of Electrical Sciences > Electrical Communication Engineering
Date Deposited: 12 Nov 2009 13:01
Last Modified: 19 Sep 2010 05:31
URI: http://eprints.iisc.ac.in/id/eprint/20193

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