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Laser ablation and characterization of $cabi_2ta_20_9$ thin films

Das, Rasmi R and Perez, W and Bhattacharya, P and Krupanidhi, SB and Katiyar, Ram S (2001) Laser ablation and characterization of $cabi_2ta_20_9$ thin films. In: Integrated Ferroelectrics, 36 (1-4). pp. 63-71.

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Thin films of Bi-layered compound $CaBi_2Ta_2O_9$ were grown by using the pulsed laser deposition technique on $Pt/TiO_2/SiO_2/Si$ substrate. The effect of substrate temperature on crystallization was investigated within the temperature range of 500-750 °C. X-ray diffraction studies confirms the evolution of the phase formation at 500 °C, which might be due to higher energy of laser fluence. The films deposited at lower substrate temperature showed relatively smaller grain size with lower surface roughness observed by atomic force microscopy. The dielectric measurements were done in order to study the dispersion of dielectric constant and tangent loss within a frequency range of 1kHz to 1MHz. The high frequency dielectric constant was estimated to be about 100 with a dissipation factor of 0.02. Films deposited at 650 °C substrate temperature, 100 mTorr oxygen pressure and annealed at 750 °C showed remanent polarization $(2Pr \sim 4.6 \mu C/cm^2)$ and coercive field Ec( \sim 112 kV/cm). The switching observed in the capacitance-voltage characteristics confirms the presence of ferroelectricity in CBT films. Micro-Raman spectroscopy was used to study the different vibrational modes present in the films deposited under different growth conditions.

Item Type: Journal Article
Publication: Integrated Ferroelectrics
Publisher: Taylor & Francis
Additional Information: Copyright of this article belongs to Taylor & Francis.
Keywords: PLD;Ferroelectric;Bi-layered;micro-Raman.
Department/Centre: Division of Chemical Sciences > Materials Research Centre
Date Deposited: 19 Aug 2008
Last Modified: 27 Aug 2008 13:43
URI: http://eprints.iisc.ac.in/id/eprint/15640

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