Suresh, BS and Padma, DK (1986) Reactivities of Tetrahalosilanes and Silane with Sulphur Trioxide. In: Polyhedron, 5 (10). pp. 1579-1580.
PDF
cc.pdf Restricted to Registered users only Download (274kB) | Request a copy |
Abstract
Reactions of tetrahalosilanes $[SiX_4$ (X = F, Cl or Br)] and silane $(SiH_4)$ with sulphur trioxide $(SO_3)$ have been studied under different experimental conditions. Each of the silanes behaves differently in accordance with bond energy of the Si-X bond. While $SiF_4$ remains unreactive even at 600°C, $SiCl_4$ reacts with $SO_3$ at 500°C, giving rise to hexachlorodisiloxane $[(SiCl_3)_2O]$ as the major product. In contrast $SiBr_4$ and $SiH_4$ react with $SO_3$ at room temperature and below room temperature, respectively, yielding silica as one of the products of reaction. In all cases the $SO_3$ is reduced to Sulphur dioxide.
Item Type: | Journal Article |
---|---|
Publication: | Polyhedron |
Publisher: | Elsevier |
Additional Information: | Copyright for this article beongs to Elsevier. |
Keywords: | Reactivities;tetrahalosilanes;silane;sulphur trioxide. |
Department/Centre: | Division of Chemical Sciences > Inorganic & Physical Chemistry |
Date Deposited: | 29 Jul 2008 |
Last Modified: | 19 Sep 2010 04:48 |
URI: | http://eprints.iisc.ac.in/id/eprint/15330 |
Actions (login required)
View Item |