Heat treatment induced structural and optical properties of rf magnetron sputtered tantalum oxide films

Chandra, Jagadeesh SV and Rao, Mohan G and Uthanna, S (2007) Heat treatment induced structural and optical properties of rf magnetron sputtered tantalum oxide films. In: Crystal Research and Technology, 42 (3). pp. 290-294.

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Abstract

Rf magnetron sputtering technique was employed for preparation of tantalum oxide films on quartz and crystalline silicon (111) substrates held at room temperature by sputtering of tantalum in an oxygen partial pressure of $1X10^{-4} mbar$. The films were annealed in air for an hour in the temperature range 573 – 993 K. The effect of annealing on the chemical binding configuration, structure and optical absorption of tantalum oxide films was systematically studied.

Item Type:	Journal Article
Publication:	Crystal Research and Technology
Publisher:	WILEY-VCH Verlag
Additional Information:	Copyright of this article belongs to WILEY-VCH Verlag.
Keywords:	tantalum oxide;magnetron sputtering;structure;optical absorption
Department/Centre:	Division of Physical & Mathematical Sciences > Instrumentation Appiled Physics
Date Deposited:	29 May 2008
Last Modified:	19 Sep 2010 04:45
URI:	http://eprints.iisc.ac.in/id/eprint/14078

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