Effect of deposition parameters on the structural properties and $T_c$ of YBaCuO films by high pressure oxygen sputtering

Muralidhar, GK and Rao, Mohan G and Raghunathan, J and Mohan, S (1992) Effect of deposition parameters on the structural properties and $T_c$ of YBaCuO films by high pressure oxygen sputtering. In: Physica C: Superconductivity, 192 (3-4). pp. 447-452.

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Abstract

Superconducting $YBa_2Cu_3O_{7-\delta}$ films were formed using a high pressure oxygen sputtering technique (HOST). The structural properties and the transition temperature of these films are correlated with their deposition parameters such as the oxygen pressure, substrate temperature and inter-electrode distance (IED). It was shown that films prepared at an oxygen pressure of 2.4 mbar, substrate temperature of 750°C and IED of around 19 mm produced good quality as deposited superconducting films with transition temperature $T_c$(0) of 88.5 K and $T_{c\hspace{2mm}on\hspace{2mm}set}$ of 92 K. The critical currents of these films were around $5\times10 A/cm^2$.

Item Type:	Journal Article
Publication:	Physica C: Superconductivity
Publisher:	Elsevier Science B.V.
Additional Information:	Copyright of this article belongs to Elsevier Science B.V.
Department/Centre:	Division of Physical & Mathematical Sciences > Instrumentation Appiled Physics
Date Deposited:	31 Mar 2008
Last Modified:	19 Sep 2010 04:43
URI:	http://eprints.iisc.ac.in/id/eprint/13531

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