ePrints@IIScePrints@IISc Home | About | Browse | Latest Additions | Advanced Search | Contact | Help

Evolution of Metastable Microstructures in Laser Ablation Deposited $Ni_{75}Al_{25}$ Thin Films

Bysakh, Sandip and Das, PK and Chattopadhyay, K (2001) Evolution of Metastable Microstructures in Laser Ablation Deposited $Ni_{75}Al_{25}$ Thin Films. In: Scripta Materialia, 44 (8-9). pp. 1847-1851.

[img] PDF
Restricted to Registered users only

Download (301kB) | Request a copy


Intermetallic thin films find application as protective high-temperature oxidation resistant coatings on gas turbine and aerospace components. The Intermetallic compound $Ni_3Al$ has potential towards application as protective coating and as well as bond coat between thermal barrier coating and superalloy engine components. Laser ablation is a powerful technique of depositing thin films of refractory materials. Due to the fast nature of the deposition process, the deposited matter experiences conditions far away from equilibrium. It is therefore important to study the phase evolution in laser ablation deposited $Ni_3Al$ film. In the present paper the phase formation in vapour deposited film and phase evolution during heating will be discussed.

Item Type: Journal Article
Publication: Scripta Materialia
Publisher: Elsevier
Additional Information: Copyright of this article belongs to Elsevier.
Keywords: Laser ablation;TEM;Amorphous film;Clustering
Department/Centre: Division of Mechanical Sciences > Materials Engineering (formerly Metallurgy)
Division of Chemical Sciences > Inorganic & Physical Chemistry
Date Deposited: 13 Apr 2007
Last Modified: 19 Sep 2010 04:36
URI: http://eprints.iisc.ac.in/id/eprint/10526

Actions (login required)

View Item View Item