Number of items: 1.
Conference Proceedings
Mukhopadhyay, S and Mitra, S and Ding, Y M and Ganapathi, K L and Misra, D and Bhat, N and Tapily, K and Clark, R D and Consiglio, S and Wajda, C S and Leusink, G J
(2016)
Effect of Post Plasma Oxidation on Ge Gate Stacks Interface Formation.
In: International Symposium on Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 6 held as a part of the 229th Meeting of The Electrochemical-Society , MAY 29-JUN 02, 2016, San Diego, CA, pp. 303-312.
This list was generated on Fri Feb 22 06:34:48 2019 IST.
