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Vargheese, Deenamma K and Rao, Mohan G (2001) Studies on titanium nitride coatings-effect of ion bombardment. In: Ion Beam Synthesis and Processing of Advanced Materials. Symposium, 27-29 Nov. 2000, Boston, MA, USA, O11.9.1-O11.9.6.
Vargheese, Deenamma K and Rao, Mohan G (2001) Electrical properties of silicon nitride films prepared by electron cyclotron resonance assisted sputter deposition. In: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 19 (5). 2122 -2126.
Vargheese, Deenamma K and Rao, Mohan G (2001) Ion-assisted deposition of silicon nitride films using electron cyclotron resonance plasma. In: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 19 (4). 1336 -1340.
Vargheese, Deenamma K and Rao, Mohan G and Balasubramanian, TV and Kumar, Sanjiv (2001) Preparation and characterization of TiN films by electron cyclotron resonance (ECR) sputtering for diffusion barrier applications. In: Materials Science and Engineering B, 83 (1-3). pp. 242-248.
Vargheese, Deenamma K and Rao, Mohan G (2000) Sputtered flux distribution on the substrate in electron cyclotron resonance sputtering simulation and experimental study. In: Journal of Applied Physics, 87 (10). pp. 7544-7550.
Vargheese, Deenamma K and Rao, Mohan G (2000) Electron cyclotron resonance plasma source for ion assisted deposition of thin films. In: Review of Scientific Instruments, 71 (2). pp. 467-472.
