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Abhilash, V and Balu, R and Balaji, S and Nathan, Senthil S and Mohan, S (2004) Monte Carlo simulation of transport process of the sputtered species in the facing target sputtering technique. In: Computational Materials Science, 30 (3-4). pp. 523-529.
Nathan, Senthil S and Rao, Mohan G and Mohan, S (1999) Process-kinetics in facing targets sputtering of multi-component oxide thin films. In: Thin Solid Films, 347 (1-2). pp. 14-24.
Nathan, Senthil S and Rao, Mohan G and Mohan, S (1998) Transport of sputtered atoms in facing targets sputtering geometry: A numerical simulation study. In: Journal of Applied Physics, 84 (1). pp. 564-571.
Nathan, Senthil S and Muralidhar, GK and Rao, Mohan G and Mohan, S (1997) Studies of process parameter controlled composition variation in sputtered $YBa_2Cu_3O_{7-x}$ films. In: Vacuum, 48 (2). pp. 113-118.
Nathan, Senthil S and Muralidhar, GK and Rao, Mohan G and Mohan, S (1997) Effect of process parameters on glow discharge and film thickness uniformity in facing target sputtering. In: Thin Solid Films, 292 (1-2). pp. 20-25.
