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Misra, DD and Bhuyian, MNU and Ding, YM and Ganapathi, KL and Bhat, N (2020) Emerging high-k dielectrics for nanometer CMOS technologies and memory devices. [Book Chapter]
Ding, YM and Misra, D (2016) Dry and Wet Processed Interface Layer in Ge/High-K Devices studied by Deep Level Transient Spectroscopy. In: 7th International Symposium on Dielectrics for Nanosystems - Materials Science, Processing, Reliability and Manufacturing held as part of the 229th Meeting of The Electrochemical-Society, MAY 29-JUN 02, 2016, San Diego, CA, pp. 329-333.
Mukhopadhyay, S and Mitra, S and Ding, YM and Ganapathi, KL and Misra, D and Bhat, N and Tapily, K and Clark, RD and Consiglio, S and Wajda, CS and Leusink, GJ (2016) Effect of Post Plasma Oxidation on Ge Gate Stacks Interface Formation. In: International Symposium on Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 6 held as a part of the 229th Meeting of The Electrochemical-Society , MAY 29-JUN 02, 2016, San Diego, CA, pp. 303-312.
Misra, D and Ding, YM and Mukhopadhyay, S and Ganapathi, KL and Bhat, N (2016) Reduction of interface states in Ge/High-k gate stacks and its reliability implications. In: 13th IEEE International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2016, 25-28 October 2016, Hangzhou, pp. 499-503.