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Conference Paper

Deepak, GC and Bhat, Navakanta and Shivashankar, SA (2007) Structural and Electrical Properties of Er 203 Thin Films Deposited by RF Sputtering for Gate Dielectric Applications. In: E1-0586, 211th ECS Meeting, Chicago, USA, May 2007, USA.

Journal Article

Deepak, GC and Bhat, Navakanta (2009) RF Sputtered Er2O3 Thin Films as High-k Gate Dielectrics for Germanium MOS Devices. In: Advanced gate stack, source/drain, and channel engineering for si-based cmos 5: new materials, processes, and equipment, 19 (1). pp. 175-181.

Singh, MP and Shalini, K and Shivashankar, SA and Deepak, GC and Bhat, N and Shripathi, T (2008) Microstructure, crystallinity, and properties of low-pressure MOCVD-grown europium oxide films. In: Materials Chemistry and Physics, 110 (2-3). pp. 337-343.

Singh, MP and Shalini, K and Shivashankar, SA and Deepak, GC and Bhat, N (2006) Structural and electrical properties of low pressure metalorganic chemical vapor deposition grown $Eu_2O_3$ films on Si(100). In: Applied Physics Letters, 89 (20). 201901-(1-3).

Singh, MP and Shalini, K and Shivashankar, SA and Deepak, GC and Bhat, N (2006) Structural and electrical properties of low pressure metalorganic chemical vapor deposition grown Eu2O3 films on Si(100). In: Applied Physics Letters, 89 (20). 201901 -201901.