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Chakraborty, Arpan and Mane, Anil U and Shivashankar, SA and Venkataraman, V (2003) Effect of Post-Metallization Hydrogen Annealing on C-V Characteristic of Zirconia Grown Using Atomic Layer Deposition. In: Novel Materials and Processes for Advanced CMOS. Symposium, 2-4 Dec. 2002, Boston, MA, USA, pp. 143-7.
Chakraborty, Arpan and Mane, Anil U and Shivashankar, SA and Venkataraman, V (2002) Effect of Post-Metallization Hydrogen Annealing on C-V Characteristic of Zirconia Grown Using Atomic Layer Deposition. In: MRS Proceedings, 745 (N5.2). .