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Mukhopadhyay, S and Mitra, S and Ding, YM and Ganapathi, KL and Misra, D and Bhat, N and Tapily, K and Clark, RD and Consiglio, S and Wajda, CS and Leusink, GJ (2016) Effect of Post Plasma Oxidation on Ge Gate Stacks Interface Formation. In: International Symposium on Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 6 held as a part of the 229th Meeting of The Electrochemical-Society , MAY 29-JUN 02, 2016, San Diego, CA, pp. 303-312.
Jithin, MA and Ganapathi, KL and Udayashankar, NK and Mohan, S (2020) Novel fabrication technique for NiTi and TiN micro-structures by fem to second lasers. In: 2nd International Conference on Materials Science and Manufacturing Technology 2020, ICMSMT 2020, 9-10 April 2020, Hotel AloftCoimbatore, Tamil Nadu; India.
Bhattacharjee, S and Ganapathi, KL and Mohan, S and Bhat, N (2017) Interface engineering of high-k dielectrics and metal contacts for high performance top-gated MoS2 FETs. In: 15th Symposium on Semiconductors, Dielectrics, and Metals for Nanoelectronics: In Memory of Samares Kar - 232nd ECS Meeting, 1 - 5 October 2017, National Harbor, pp. 101-107.
Misra, D and Ding, YM and Mukhopadhyay, S and Ganapathi, KL and Bhat, N (2016) Reduction of interface states in Ge/High-k gate stacks and its reliability implications. In: 13th IEEE International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2016, 25-28 October 2016, Hangzhou, pp. 499-503.
Ganapathi, KL and Bhat, N and Mohan, S (2021) Optimization and integration of ultrathin e-beam grown HfO2gate dielectrics in MoS2transistors. In: Journal of Physics D: Applied Physics, 54 (44).
