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Anand, Venu and Nair, Aswathi R and Shivashankar, SA and Rao, Mohan G (2015) Atmospheric pressure plasma chemical vapor deposition reactor for 100 mm wafers, optimized for minimum contamination at low gas flow rates. In: APPLIED PHYSICS LETTERS, 107 (9).
Shaik, Habibuddin and Anand, Venu and Rao, Mohan G (2014) On the quality of hydrogenated amorphous silicon deposited by sputtering. In: MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 26 . pp. 367-373.
Mathew, Ambily and Anand, Venu and Rao, Mohan G and Munichandraiah, N (2012) Effect of iodine concentration on the photovoltaic properties of dye sensitized solar cells for various I-2/LiI ratios. In: ELECTROCHIMICA ACTA, 87 . pp. 92-96.
