Epitaxial oxide thin films by pulsed laser deposition:Retrospect and prospect

Hegde, MS (2001) Epitaxial oxide thin films by pulsed laser deposition:Retrospect and prospect. In: Proceedings of the Indian Academy of Sciences Chemical Sciences, 113 (5). pp. 445-458.

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Abstract

Pulsed laser deposition (PLD) is a unique method to obtain epitaxial multi-component oxide films. Highly stoichiometric, nearly single crystal-like materials in the form of films can be made by PLD. Oxides which are synthesized at high oxygen pressure can be made into films at low oxygen partial pressure. Epitaxial thin films of high Tc cuprates, metallic, ferroelectric, ferromagnetic, dielectric oxides, superconductor–metal–superconductor Josephson junctions and oxide superlattices have been made by PLD. In this article, an overview of preparation, characterization and properties of epitaxial oxide films and their applications are presented. Future prospects of the method for fabricating epitaxial films of transition metal nitrides, chalcogenides, carbides and borides are discussed.

Item Type:	Journal Article
Publication:	Proceedings of the Indian Academy of Sciences Chemical Sciences
Publisher:	Indian Academy of Sciences
Additional Information:	Copyright for this article belongs to Indian Academy of Sciences.
Keywords:	Pulsed laser deposition;epitaxial films;superconducting oxide films;metallic oxides;ferromagnetic oxide films;superlattices
Department/Centre:	Division of Chemical Sciences > Solid State & Structural Chemistry Unit
Date Deposited:	09 Sep 2004
Last Modified:	19 Sep 2010 04:16
URI:	http://eprints.iisc.ac.in/id/eprint/1909

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