Jugade, SS and Aggarwal, A and Naik, AK (2021) Nanomechanical spectroscopy of ultrathin silicon nitride suspended membranes. In: EPJ Applied Physics, 93 (5).
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Abstract
Mechanical properties of a nanomechanical resonator significantly impact the performance of a resonant Nano-electromechanical system (NEMS) device. We study the mechanical properties of suspended membranes fabricated out of low-pressure chemical vapor deposited silicon nitride thin films. We fabricated doubly-clamped membranes of silicon nitride with thickness less than 50 nm and length varying from 5 to 60 μm. The elastic modulus and stress in the suspended membranes were measured using Atomic Force Microscope (AFM)-based nanomechanical spectroscopy. The elastic moduli of the suspended membranes are significantly higher than those of corresponding on-substrate thin films. We observed a reduction in net stress after the fabrication of suspended membrane, which is explained by estimating the thermal stress and intrinsic stress. We also use a mathematical model to study the stress and thickness-dependent elastic modulus of the ultrathin membranes. Lastly, we study the capillary force-gradient between the SiNx suspended membrane-Si substrate that could collapse the suspended membrane. © EDP Sciences, 2021.
Item Type: | Journal Article |
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Publication: | EPJ Applied Physics |
Publisher: | EDP Sciences |
Additional Information: | The copyright for this article belongs to Authors |
Keywords: | Atomic force microscopy; Elastic moduli; Electromechanical devices; NEMS; Nitrides; Silicon nitride; Substrates; Thin films, Chemical vapor deposited; Intrinsic stress; Nano electromechanical systems; Nanomechanical resonators; Silicon nitride thin films; Suspended membranes; Ultra-thin membranes; Ultrathin silicon, Membranes |
Department/Centre: | Division of Interdisciplinary Sciences > Centre for Nano Science and Engineering |
Date Deposited: | 23 Aug 2021 09:45 |
Last Modified: | 23 Aug 2021 09:45 |
URI: | http://eprints.iisc.ac.in/id/eprint/69254 |
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