Magnetoresistance and magnetic field induced metal–insulator transition in intercalated amorphous carbon

Kumari, Latha and Subramanyam, SV (2006) Magnetoresistance and magnetic field induced metal–insulator transition in intercalated amorphous carbon. In: Materials Science and Engineering: B, 129 (1-3). pp. 48-53.

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Abstract

In this work, we discuss the preparation of iodine and sulfur incorporated amorphous carbon (a-C) films by vapor phase pyrolysis technique. Iodine incorporated a-C films depict an unusual resistivity behavior at low temperatures, where a clear positive temperature coefficient (PTCR) is witnessed, which also depicts a pyrolysis temperature and iodine incorporation induced metal–insulator (M–I) transition. Magnetic field induced M–I transition is also observed in iodinated samples. Magnetoresistance measurements performed on these films from 1.3–10 K in the presence of magnetic field (0–7 T) account for a positive magnetoresistance irrespective of the regimes they fall in. Universal scaling of magnetoconductance observed in intercalated a-C system depicts the dominance of electron–electron interaction.

Item Type:	Journal Article
Publication:	Materials Science and Engineering: B
Publisher:	Elsevier
Additional Information:	Copyright of this article belongs to Elsevier.
Keywords:	Amorphous carbon;Electrical properties;Metal–insulator transition;Magnetoresistance
Department/Centre:	Division of Physical & Mathematical Sciences > Physics
Date Deposited:	16 May 2006
Last Modified:	19 Sep 2010 04:26
URI:	http://eprints.iisc.ac.in/id/eprint/6685

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