Karunagaran, B and Kumar, Rajendra RT and Mangalaraj, D and Narayandass, Sa K and Rao, Mohan G (2002) Influence of thermal annealing on the composition and structural parameters of DC magnetron sputtered titanium dioxide thin films. In: Crystal Research and Technology, 37 (12). pp. 1285-1292.
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Titanium dioxide films have been deposited using DC magnetron sputtering technique. Films were deposited onto RCA cleaned p-silicon substrates at the ambient temperature at an oxygen partial pressure of $7 \times 10^{-5}$ mbar and sputtering pressure of $1 \times 10 ^{-3}$ mbar. The deposited films were annealed in the temperature range 673-873 K. The structure and composition of the films were confirmed using X-ray diffraction and Auger electron spectroscopy. The structure of the films deposited at the ambient was found to be amorphous and the films annealed at 673 K and above were crystalline with anatase structure. The lattice constants, grain size, microstrain and the dislocation density of the film are calculated and correlated with annealing temperature.
| Item Type: | Journal Article |
|---|---|
| Publication: | Crystal Research and Technology |
| Publisher: | WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim |
| Additional Information: | The copyright belongs to WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. |
| Keywords: | Titanium dioxide thin films;DC magnetron sputtering;AES;Structural parameters |
| Department/Centre: | Division of Physical & Mathematical Sciences > Instrumentation Appiled Physics |
| Date Deposited: | 01 Feb 2007 |
| Last Modified: | 27 Aug 2008 11:53 |
| URI: | http://eprints.iisc.ac.in/id/eprint/6297 |
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