Industrial applications of X-Ray Photoelectron Spectroscopy (XPS) in India

Addepalli, Swarnagowri (2019) Industrial applications of X-Ray Photoelectron Spectroscopy (XPS) in India. In: JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 231 (SI). pp. 11-42.

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Abstract

This review paper summarizes the industrial applications of XPS in India from open literature. Many industrial research and development centers in India, except for a few, do not have in-house XPS systems, and leverage either the instruments available at many government laboratories or universities across various locations in India, or their in-house instruments in other parts of the world for their research activities. While XPS is being used for a wide range of applications, based on an exhaustive literature search by the author, an understanding of the scientific basis of the technique as well as related analytical techniques such as X-ray Excited Auger Electron Spectroscopy (XAES) and depth profiling, the instrumentation, the measurement, and interpretation of the results could be improved. This could potentially avoid artifacts as well as misinterpretation of results. This paper also highlights a few key points that must be considered while measuring and interpreting XPS data.

Item Type:	Journal Article
Publication:	JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA
Publisher:	ELSEVIER SCIENCE BV
Additional Information:	copyright for this article belongs to JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA
Keywords:	X-ray photoelectron spectroscopy; XPS; Electron spectroscopy for chemical analysis; ESCA; Characterization; India
Department/Centre:	Division of Interdisciplinary Sciences > Centre for Nano Science and Engineering
Date Deposited:	17 May 2019 11:56
Last Modified:	17 May 2019 11:56
URI:	http://eprints.iisc.ac.in/id/eprint/62435

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