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Sub-nanometer narrow bandwidth gratings using deeply etched SOI rib waveguides

Samad, Shafeek Abdul and Tarimala, Badarinarayana and Hegde, Gopalkrishna and Talabattula, Srinivas (2018) Sub-nanometer narrow bandwidth gratings using deeply etched SOI rib waveguides. In: Conference on Silicon Photonics - From Fundamental Research to Manufacturing, APR 23-26, 2018, Strasbourg, FRANCE.

Full text not available from this repository.
Official URL: https://doi.org/10.1117/12.2307075

Abstract

We report the design and analysis of a novel sub nanometer narrow bandwidth grating using sidewall corrugated SOI rib waveguide. Wavelength filters with narrow bandwidth, smaller device footprint, lesser complexity and higher fabrication tolerance are essential for on-chip Wavelength Division Multiplexing (WDM) applications. In this paper, we propose a simple and effective method to obtain ultra-narrow bandwidth. The design consists of a deeply etched rib waveguide with slab sidewall corrugation for index modulation. In order to understand the device characteristics, numerical investigations were employed. With a corrugation width of 60 nm, narrow 3-dB bandwidth of 0.5 nm at 1550 nm was achieved. Our results also serve as the precursor for a Dense WDM architecture with channel spacing of 0.8 nm, realizable by varying the grating pitch.

Item Type: Conference Poster
Series.: Proceedings of SPIE
Publisher: SPIE-INT SOC OPTICAL ENGINEERING
Additional Information: Conference on Silicon Photonics - From Fundamental Research to Manufacturing, Strasbourg, FRANCE, APR 23-26, 2018
Keywords: Waveguide Bragg Gratings; rib waveguides; dense wavelength division multiplexing (DWDM); integrated optical filter; silicon photonics; silicon-on-insulator (SOI)
Department/Centre: Division of Electrical Sciences > Electrical Communication Engineering
Division of Interdisciplinary Sciences > Centre for Nano Science and Engineering
Date Deposited: 28 Jan 2019 10:20
Last Modified: 28 Jan 2019 10:20
URI: http://eprints.iisc.ac.in/id/eprint/61513

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