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Note: Multi-sheet light enables optical interference lithography

Mohan, Kavya and Tyagi, Ayush and Mondal, Partha Pratim (2018) Note: Multi-sheet light enables optical interference lithography. In: REVIEW OF SCIENTIFIC INSTRUMENTS, 89 (6).

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Official URL: https://dx.doi.org/10.1063/1.5022499


We propose and demonstrate a modified spatial filter-based single-shot lithography technique for fabricating an array of microfluidic channels. This is achieved by illuminating the photopolymer specimen with a multiple light sheet (MLS) pattern. Modified spatial filtering is employed in a cylindrical lens system to generate the MLS pattern. The transmission window the difference (alpha - beta) angle] of the spatial filter determines the characteristics of the pattern and the fabricated microfluidic channel array. After exposing to a negative photoresist (DPHPA monomer with rose bengal as the photoinitiator), this gives rise to an array of micro-fluidic channels (post development process). We studied the effect of micro-channel geometry (channel width, inter-channel separation, and aspect ratio) for varying exposure times that show near-linear dependence. The results show that the fabricated array has 7 prominent channels with an individual channel width and inter-channel separation of approximately 5 mu m and 12 mu m, respectively. The proposed technique enables selective plane patterning and reduces the overall cost for large-scale production. Published by AIP Publishing.

Item Type: Journal Article
Additional Information: Copyright of this article belong to AMER INST PHYSICS, 1305 WALT WHITMAN RD, STE 300, MELVILLE, NY 11747-4501 USA
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation Appiled Physics
Division of Physical & Mathematical Sciences > Physics
Depositing User: Id for Latest eprints
Date Deposited: 26 Jul 2018 15:09
Last Modified: 26 Jul 2018 15:09
URI: http://eprints.iisc.ac.in/id/eprint/60303

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