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Nitride Dielectric Environments to Suppress Surface Optical Phonon Dominated Scattering in High-Performance Multilayer MoS2 FETs

Bhattacharjee, Shubhadeep and Ganapathi, Kolla Lakshmi and Chandrasekar, Hareesh and Paul, Tathagata and Mohan, Sangeneni and Ghosh, Arindam and Raghavan, Srinivasan and Bhat, Navakanta (2017) Nitride Dielectric Environments to Suppress Surface Optical Phonon Dominated Scattering in High-Performance Multilayer MoS2 FETs. In: ADVANCED ELECTRONIC MATERIALS, 3 (1).

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Official URL: http://dx.doi.org/10.1002/aelm.201600358


The ultrathin channel in 2D semiconductors, although playing host to several interesting properties, also renders strong interactions (scattering) of charge carriers with the surrounding medium. The over-arching dominance of surface (interfacial) optical phonons in 2D charge transport and engineering ideal nitride-based dielectric environments for large performance gains is reported. Charge transport in MoS2 field effect transistors (FETs) fabricated on three conventional substrates, SiO2, Al2O3, and HfO2, is contrasted with a newly introduced, CMOS-compatible nitride-based dielectric: aluminum nitride (AlN) by employing semi-classical models which account for charged impurity, surface optical phonon, and intrinsic phonon scattering. Unlike previous reports focused on charge impurity scattering, this work presents a new paradigm of utilizing high optical phonon energies intrinsic to ``stiff `` nitride bonds. This results in substantially lower surface optical phonon scattering in 2D FETs which directly influences peak field effect (FE) mobility, high field mobility degradation, and temperature-dependent mobility. Leveraging on these insights, high-performance sulfur-passivated MoS2 FETs with an optimum all-nitride environment (hexagonal boron nitride/MoS2/AlN) are demonstrated with FE mobility up to 72.8 cm(2) V-1 s(-1). This work is envisioned to address important issues in design of dielectric environments for a host of applications based on 2D materials.

Item Type: Journal Article
Additional Information: Copy right for this article belongs to the WILEY-BLACKWELL, 111 RIVER ST, HOBOKEN 07030-5774, NJ USA
Department/Centre: Division of Chemical Sciences > Materials Research Centre
Division of Electrical Sciences > Electrical Communication Engineering
Division of Interdisciplinary Research > Centre for Nano Science and Engineering
Division of Physical & Mathematical Sciences > Physics
Depositing User: Id for Latest eprints
Date Deposited: 09 Mar 2017 06:09
Last Modified: 09 Mar 2017 06:09
URI: http://eprints.iisc.ac.in/id/eprint/56357

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