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Tin Oxide Film Deposition and Characterization for a Chemoresistive Gas Sensor

Velmathi, G and Mohan, S and Henry, Rabinder (2016) Tin Oxide Film Deposition and Characterization for a Chemoresistive Gas Sensor. In: IETE JOURNAL OF RESEARCH, 62 (4). pp. 525-531.

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Official URL: http://dx.doi.org/10.1080/03772063.2015.1083909

Abstract

The proposed work studies the synthesis, structural, and sensitivity of tin oxide films deposited by sputtering for a gas sensor. This includes an analysis of a tin oxide film doped with noble metal palladium. Gas sensitivity of the deposited layer is analysed as per the deposition parameters such as the thickness of the film, substrate temperature, argon-oxygen ratio of the sputtering environment, and duration and doping metal weight percentage into the tin oxide films and the results obtained are explained.

Item Type: Journal Article
Additional Information: Copy right for this article belongs to the TAYLOR & FRANCIS LTD, 2-4 PARK SQUARE, MILTON PARK, ABINGDON OR14 4RN, OXON, ENGLAND
Department/Centre: Division of Interdisciplinary Research > Centre for Nano Science and Engineering
Depositing User: Id for Latest eprints
Date Deposited: 22 Oct 2016 10:20
Last Modified: 22 Oct 2016 10:20
URI: http://eprints.iisc.ac.in/id/eprint/55105

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