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Controlled Tuning of Thin Film Deposition of IrO2 on Si Using Pulsed Laser Ablation Technique

Koshy, Abraham M and Bhat, Shwetha G and Kumar, Anil PS (2016) Controlled Tuning of Thin Film Deposition of IrO2 on Si Using Pulsed Laser Ablation Technique. In: International Conference on Condensed Matter and Applied Physics (ICC) , OCT 30-31, 2015, Bikaner, INDIA.

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Official URL: http://dx.doi.org/10.1063/1.4946418

Abstract

We have successfully grown a stable phase of polycrystalline IrO2 on Si (100) substrate. We have found that the phase of IrO2 can be controllably tuned to obtain either Ir or IrO2, using pulsed laser ablation technique. O-2, conditions during the deposition influences the phase directly and drastically whereas annealing conditions do not show any variation in the phase of thin film. X-ray diffraction and X-ray photoetnission experiments confirm both Ir and IrO2 can be successively grown on Si using IrO2, target. Also, the morphology is found to be influenced by the O-2 conditions.

Item Type: Conference Proceedings
Additional Information: Copy right for this article belongs to the AMER INST PHYSICS, 2 HUNTINGTON QUADRANGLE, STE 1NO1, MELVILLE, NY 11747-4501 USA
Department/Centre: Division of Physical & Mathematical Sciences > Physics
Depositing User: Id for Latest eprints
Date Deposited: 30 Jun 2016 04:30
Last Modified: 30 Jun 2016 04:30
URI: http://eprints.iisc.ac.in/id/eprint/54110

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